The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Jan. 08, 2013
Applicant:
Commissariat a L'energie Atomique ET Aux Ene Alt, Paris, FR;
Inventor:
Christelle Charpin-Nicolle, Fontanil-Cornillon, FR;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 21/28 (2006.01); H01L 29/788 (2006.01); H01L 29/792 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66825 (2013.01); H01L 29/4234 (2013.01); H01L 21/28273 (2013.01); H01L 29/66833 (2013.01); H01L 29/788 (2013.01); H01L 29/792 (2013.01); H01L 21/28282 (2013.01);
Abstract
A method of making a non-volatile double-gate memory cell. A gate of the control transistor is formed with a relief on a substrate. A control gate of the memory transistor is formed with a layer of a semiconductor material covering relief. The method includes chemical mechanical polishing (CMP) so as to strip, above the relief another layer and part of the layer of a semiconductor material; stripping of the remaining other layer on both sides of the relief, etching of the layer of a semiconductor material so as to strip this material above the relief and to leave only a pattern on at least one sidewall of the relief.