The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Aug. 23, 2012
Applicant:
Archit Giridhar, Singapore, SG;
Inventor:
Archit Giridhar, Singapore, SG;
Assignee:
STMicroelectronics Asia Pacific Pte Ltd, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/10 (2006.01); C12M 1/34 (2006.01); C12M 3/00 (2006.01); C12Q 1/68 (2006.01);
U.S. Cl.
CPC ...
C12M 1/34 (2013.01); C12M 3/00 (2013.01); B01L 2300/041 (2013.01); C12Q 1/686 (2013.01); B01L 2300/042 (2013.01); B01L 2300/043 (2013.01); B01L 2300/044 (2013.01); B01L 2300/045 (2013.01); B01L 2300/046 (2013.01); B01L 2200/16 (2013.01); B01L 2200/141 (2013.01); B01L 2200/142 (2013.01);
Abstract
A testing device uses a selectively deformable substrate to capture and retain spherical beads for genetic experimentation. A method of fabricating the device is described in which a silicon substrate can be coated with a photosensitive, bio-compatible polymer for photolithographic patterning using a single mask exposure. The polymer is patterned with a matrix of wells, each well capable of expansion to accept placement of a bead in the well, and contraction to secure the bead in the well. The polymer can exhibit piezoelectric properties that cause it to respond mechanically to a selected electrical excitation.