The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2014

Filed:

Jan. 21, 2009
Applicants:

Hubert Seiberle, Weil am Rhein, DE;

Martin Schadt, Seltisberg, CH;

Mohammed Ibn-elhaj, Allschwil, CH;

Carsten Benecke, Weil am Rhein, DE;

Klaus Schmitt, Lörrach, DE;

Inventors:

Hubert Seiberle, Weil am Rhein, DE;

Martin Schadt, Seltisberg, CH;

Mohammed Ibn-Elhaj, Allschwil, CH;

Carsten Benecke, Weil am Rhein, DE;

Klaus Schmitt, Lörrach, DE;

Assignee:

Rolic AG, Zug, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/00 (2006.01); B82Y 30/00 (2011.01); G02F 1/1337 (2006.01); B29C 41/00 (2006.01); G02B 5/30 (2006.01); G02B 5/18 (2006.01); C09K 19/54 (2006.01); G02F 1/139 (2006.01);
U.S. Cl.
CPC ...
G02F 1/13378 (2013.01); B82Y 30/00 (2013.01); G02F 1/1391 (2013.01); B29K 2995/0072 (2013.01); B29C 41/003 (2013.01); G02B 5/3083 (2013.01); G02B 5/1847 (2013.01); C09K 19/542 (2013.01);
Abstract

Sub-micron-structured (nanostructured) polymer film or coatings are made by coating a substrate with a mixture of materials. One of the materials is removed using a selective solvent, leaving pores or other nanostructure. The substrate may be grooved, providing a competing nanostructure. The coating may act as an antireflective coating, optical retarder, optical diffuser, or orientation layer.


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