The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Oct. 25, 2012
Applicant:
U.s. Army Research Laboratory, Adelphi, MD (US);
Inventors:
Robert A Burke, Rockville, MD (US);
Alan S Edelstein, Alexandria, VA (US);
Assignee:
The United States of America as represented by the Secretary of the Army, Washington, DC (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01B 13/00 (2006.01); B44C 1/22 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2037 (2013.01); B44C 1/227 (2013.01);
Abstract
A method for forming a device having nanopillar and cap structures on a substrate in which the substrate is first coated with a first resist having a first exposure dose to electron beam radiation, and that after coating the first resist with a second resist having a second exposure dose less than the first resist. Electron beam lithography is then used sequentially to form the nanopillars and cap structures or, alternatively, a template for the nanopillar and cap structures.