The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2014
Filed:
Jun. 30, 2009
Katsuhisa Kasanami, Tokyo, JP;
Toshimitsu Miyata, Tokyo, JP;
Mitsunori Ishisaka, Tokyo, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
A tubular electrode () and a tubular magnet () are installed on an external section of a processing furnace () for an MMT device. A susceptor () for holding a wafer () is installed inside a processing chamber () of the processing furnace. A gate valve () for conveying the wafer into and out of the processing chamber; and a shower head () for spraying processing gas in a shower onto the wafer, are installed inside the processing furnace. A high frequency electrode () and a heater () are installed inside the susceptor () with a clearance between them and the walls forming the space. The clearances formed between the walls forming the space in the susceptor and the high frequency electrode and the heater prevent damage to the high frequency electrode and the heater even if a thermal expansion differential occurs between the high frequency electrode, the heater and the susceptor.