The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2014

Filed:

Aug. 11, 2010
Applicants:

Moon Gyu Han, Yongin-si, KR;

Hong-seok Lee, Yongin-si, KR;

Jung H. Shin, Daejeon, KR;

Kyung Jae Chung, Daejeon, KR;

Inventors:

Moon Gyu Han, Yongin-si, KR;

Hong-seok Lee, Yongin-si, KR;

Jung H. Shin, Daejeon, KR;

Kyung Jae Chung, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); G02B 7/182 (2006.01); G02B 27/14 (2006.01); B05D 1/36 (2006.01); B05D 3/00 (2006.01); B82Y 20/00 (2011.01); B29D 11/00 (2006.01); G02B 5/10 (2006.01);
U.S. Cl.
CPC ...
B29D 11/00326 (2013.01); B82Y 20/00 (2013.01); G02B 5/10 (2013.01); G02B 5/0816 (2013.01); B29D 11/00346 (2013.01);
Abstract

Provided are a reflective structure, a display apparatus including the reflective structure, and methods of manufacturing the reflective structure and the display apparatus. The reflective structure may include a reflective layer having a multiple uneven structure. The reflective layer may have a curved surface as a result of a plurality of first uneven portions, and wherein the curved surface may has a plurality of second uneven portions having a scale less than that of the first uneven portions. The plurality of first uneven portions may have a micro-scale size, and the plurality of second uneven portions may have a nano-scale size. The reflective layer may be arranged on a lower structure including a plurality of nanoparticles. A flexible material layer may be formed on the reflective layer.


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