The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2014

Filed:

Mar. 23, 2012
Applicants:

Igor Milicevic, Helmond, NL;

Mattheus Jacobus Nicolaas Van Stralen, Tilburg, NL;

Johannes Antoon Hartsuiker, Eindhoven, NL;

Eugen Aldea, Eindhoven, NL;

Eric Aloysius Kuijpers, Eindhoven, NL;

Inventors:

Igor Milicevic, Helmond, NL;

Mattheus Jacobus Nicolaas Van Stralen, Tilburg, NL;

Johannes Antoon Hartsuiker, Eindhoven, NL;

Eugen Aldea, Eindhoven, NL;

Eric Aloysius Kuijpers, Eindhoven, NL;

Assignee:

Draka Comteq B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 37/018 (2006.01);
U.S. Cl.
CPC ...
C03B 37/0183 (2013.01); C03B 37/01815 (2013.01); C03B 37/01823 (2013.01); C03B 2201/31 (2013.01);
Abstract

A method for manufacturing an optical preform via an internal vapor deposition process, wherein during the inside deposition process the velocity of the reaction zone is set so that the velocity of the reaction zone over the length of the supply side-to-discharge side is higher than the velocity of the reaction zone over the length of the discharge side-to-supply side.


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