The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2014

Filed:

May. 10, 2012
Applicants:

Kazuyuki Hashimoto, Kyoto, JP;

Tatsufumi Kusuda, Kyoto, JP;

Inventors:

Kazuyuki Hashimoto, Kyoto, JP;

Tatsufumi Kusuda, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/26 (2006.01); F27B 5/18 (2006.01); F27D 19/00 (2006.01); F27D 21/00 (2006.01); G01J 5/10 (2006.01); G01J 5/54 (2006.01); H01L 21/67 (2006.01); G01J 5/00 (2006.01); F27B 17/00 (2006.01); G01J 5/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); G01J 5/0007 (2013.01); G01J 5/026 (2013.01); F27B 17/0025 (2013.01); H01L 2924/13091 (2013.01); H01L 2924/13055 (2013.01);
Abstract

After flash irradiation on a semiconductor wafer is started and then the temperatures of front and back surfaces of the semiconductor wafer become equal to each other, the temperature of the back surface of the semiconductor wafer, which has a known emissivity, is measured with a radiation thermometer. The emissivity of the front surface of the semiconductor wafer is calculated based on the intensity of radiated light from a black body having an equal temperature to the temperature of the back surface thereof, and the intensity of radiated light actually radiated from the front surface of the semiconductor wafer. Then, the temperature of the front surface of the semiconductor wafer heated by the flash irradiation is calculated based on the calculated emissivity and the intensity of the radiated light from the front surface of the semiconductor wafer that has been measured after the flash irradiation is started.


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