The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Sep. 13, 2010
Applicants:
Tatsuro Masuyama, Toyonaka, JP;
Mitsuhiro Hata, Delmar, NY (US);
Inventors:
Tatsuro Masuyama, Toyonaka, JP;
Mitsuhiro Hata, Delmar, NY (US);
Assignee:
Sumitomo Chemical Company, Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 271/22 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); C07D 207/16 (2006.01);
U.S. Cl.
CPC ...
C07C 271/22 (2013.01); G03F 7/0392 (2013.01); G03F 7/20 (2013.01); C07D 207/16 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01);
Abstract
A photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): wherein Rrepresents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc., Rand Reach independently represent a hydrogen atom, etc., R, Rand Reach independently represent a hydrogen atom, etc., Arepresents a single bond or a C1-C2 alkylene group in which one or more —CH— can be replaced by —O—.