The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Oct. 04, 2006
Bing K. Yen, Cupertino, CA (US);
David S. Kuo, Palo Alto, CA (US);
Dieter K. Weller, San Jose, CA (US);
Kim Y. Lee, Fremont, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Bing K. Yen, Cupertino, CA (US);
David S. Kuo, Palo Alto, CA (US);
Dieter K. Weller, San Jose, CA (US);
Kim Y. Lee, Fremont, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Seagate Technology LLC, Cupertino, CA (US);
Abstract
A method of fabricating a patterned perpendicular magnetic recording medium comprises steps of: (a) providing a layer stack including a magnetically soft underlayer ('SUL') and an overlying non-magnetic interlayer; (b) forming a masking layer on the non-magnetic interlayer; (c) forming a resist layer on the masking layer; (d) forming a pattern of recesses extending through the resist layer and exposing spaced apart surface portions of the masking layer; (e) extending the pattern of recesses through the masking layer to expose spaced apart surface portions of the interlayer; and (f) at least partially filling the pattern of recesses with a magnetically hard material to form a perpendicular magnetic recording layer.