The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Mar. 17, 2011
Tirunelveli S. Ravi, San Jose, CA (US);
Ananda H. Kumar, Fremont, CA (US);
Ashish Asthana, Fremont, CA (US);
Kyle Ross Tantiwong, San Jose, CA (US);
Visweswaren Sivaramakrishnan, Cupertino, CA (US);
Tirunelveli S. Ravi, San Jose, CA (US);
Ananda H. Kumar, Fremont, CA (US);
Ashish Asthana, Fremont, CA (US);
Kyle Ross Tantiwong, San Jose, CA (US);
Visweswaren Sivaramakrishnan, Cupertino, CA (US);
Crystal Solar, Inc., Santa Clara, CA (US);
Abstract
An anodic etching system for simultaneously etching a multiplicity of substrates comprises: an etching tank for containing therein an etchant solution; a power supply connected between a first electrode and a second electrode, the first electrode and the second electrode being immersible in the etchant solution and positioned at opposite ends of the tank; and a plurality of support plates serially arranged between the first electrode and the second electrode and sealed to walls of the tank, wherein each of the plurality of support plates is configured to support at least one of the multiplicity of substrates, and wherein any consecutive pair of the plurality of support plates defines an isolated volume of the tank for containing a portion of the etchant solution. The plurality of support plates may be susceptors configured for holding the multiplicity of substrates in a chemical vapor deposition tool.