The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2014

Filed:

Aug. 11, 2008
Applicants:

Erwan Godot, Annecy, FR;

Remi Thollot, Saint Christo en Jarez, FR;

Amaud Favre, Annecy, FR;

Inventors:

Erwan Godot, Annecy, FR;

Remi Thollot, Saint Christo en Jarez, FR;

Amaud Favre, Annecy, FR;

Assignee:

Alcatel Lucent, Paris, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); F26B 5/04 (2006.01); F26B 25/22 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01); H01L 21/677 (2006.01); F26B 5/00 (2006.01);
U.S. Cl.
CPC ...
F26B 5/04 (2013.01); F26B 5/048 (2013.01); F26B 25/225 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/6735 (2013.01); H01L 21/67769 (2013.01); F26B 5/00 (2013.01);
Abstract

The aim of the invention is to provide a method for the treatment of a transport support () for the conveyance and storage of semiconductor substrates, with said support () possibly having first undergone a cleaning operation using a liquid. The method includes a treatment stage in which the transport support () is placed in a sealed chamber () connected to a vacuum pump () and said transport support () is subjected to the combined action of a subatmospheric pressure and infrared radiation to favor the removal of foreign bodies on the walls of the transport support (). The invention also concerns a treatment station for a transport support () for implementation of the method.


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