The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2014

Filed:

Oct. 11, 2012
Applicant:

Novatek Microelectronics Corp., Hsinchu, TW;

Inventors:

Yu-Shu Liu, Hsinchu, TW;

Chun-Wei Chen, Taipei, TW;

Chun Wang, Shanghai, CN;

Wan-Hsi Hsieh, Taoyuan County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/48 (2006.01);
U.S. Cl.
CPC ...
G06K 9/48 (2013.01);
Abstract

Method for detecting disappearance of a pattern is used to detect whether a fixed-still pattern in dynamic displayed images disappears. Method includes analyzing a pattern characteristic parameter which represents the fixed-still pattern from each of images continuously displayed in a time sequence, It is checked whether the pattern characteristic parameter fast decreases from at least greater than a high level to at least less than a low level, as a first state transition. Sum of absolute difference (SAD) values for all of the pixels between a previous image and a current image is calculated. It is checked whether the sum of the SAD values fast increases from at least less than a low level to at least greater than a high level, as a second state transition. When the first state transition and the second state transition occur simultaneously, it is determined that the fixed-still pattern disappears in the display.


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