The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2014

Filed:

Apr. 14, 2008
Applicants:

Hidayat Kisdarjono, Vancouver, WA (US);

Apostolos T. Voutsas, Portland, OR (US);

Inventors:

Hidayat Kisdarjono, Vancouver, WA (US);

Apostolos T. Voutsas, Portland, OR (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78609 (2013.01); H01L 29/78696 (2013.01); H01L 29/42384 (2013.01); H01L 29/78645 (2013.01);
Abstract

A bottom-contacted top gate (TG) thin film transistor (TFT) with independent field control for off-current suppression is provided, along with an associated fabrication method. The method provides a substrate, and forms source and drain regions overlying the substrate, each having a channel interface top surface. A channel is interposed between the source and drain, with source and drain contact regions immediately overlying the source/drain (S/D) interface top surfaces, respectively. A first dielectric layer is formed overlying the source, drain, and channel. A first gate is formed overlying the first dielectric, having a drain sidewall located between the contact regions. A second dielectric layer is formed overlying the first gate and first dielectric. A second gate overlies the second dielectric, located over the drain contact region.


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