The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2014

Filed:

Sep. 29, 2009
Applicants:

Rintaro Koda, Tokyo, JP;

Masaru Kuramoto, Kanagawa, JP;

Eiji Nakayama, Miyagi, JP;

Tsuyoshi Fujimoto, Kanagawa, JP;

Inventors:

Rintaro Koda, Tokyo, JP;

Masaru Kuramoto, Kanagawa, JP;

Eiji Nakayama, Miyagi, JP;

Tsuyoshi Fujimoto, Kanagawa, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2010.01); B82Y 20/00 (2011.01); H01S 5/323 (2006.01); H01S 5/227 (2006.01); H01S 5/16 (2006.01); H01S 5/343 (2006.01);
U.S. Cl.
CPC ...
H01S 5/16 (2013.01); H01S 5/2277 (2013.01); H01S 5/168 (2013.01); H01S 5/34333 (2013.01); B82Y 20/00 (2013.01); H01S 5/2275 (2013.01);
Abstract

A method for producing a semiconductor laser having an edge window structure includes the steps of forming masks of insulating films on a nitride-based III-V compound semiconductor substrate including first regions and second regions periodically arranged in parallel therebetween; and growing a nitride-based III-V compound semiconductor layer in a region not covered by the masks. The first region between each two adjacent second regions has two or more positions, symmetrical with respect to a center line thereof, where laser stripes are to be formed. The masks are formed on one or both sides of each of the positions where the laser stripes are to be formed at least near a position where edge window structures are to be formed such that the masks are symmetrical with respect to the center line. The nitride-based III-V compound semiconductor layer includes an active layer containing at least indium and gallium.


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