The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2014

Filed:

Nov. 21, 2007
Applicants:

Masaki Murata, Tokyo, JP;

Nobuhide Yoneya, Kanagawa, JP;

Norio Kimura, Tokyo, JP;

Inventors:

Masaki Murata, Tokyo, JP;

Nobuhide Yoneya, Kanagawa, JP;

Norio Kimura, Tokyo, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/08 (2006.01); H01L 51/00 (2006.01); H01L 51/10 (2006.01); H01L 51/05 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0095 (2013.01); H01L 51/0545 (2013.01); H01L 51/0083 (2013.01); H01L 51/0035 (2013.01); H01L 51/0541 (2013.01); H01L 51/105 (2013.01);
Abstract

A semiconductor device is provided and includes a field effect transistor having a gate electrode, a gate insulating layer, a channel forming region composed of an organic semiconductor material layer and a source/drain electrode made of a metal. A portion of the source/drain electrode in contact with the organic semiconductor material layer comprising the channel forming region is covered with an electrode coating material. Because the electrode coating material is composed of organic molecules having a functional group which can be bound to a metal ion and a functional group that binds to the source/drain electrode composed of the metal, low contact resistance and high mobility can be achieved.


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