The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2014

Filed:

Apr. 24, 2012
Applicants:

Yoshinori Honda, Hamamatsu, JP;

Fumitsugu Fukuyo, Hamamatsu, JP;

Takashi Suzuki, Hamamatsu, JP;

Norio Ichikawa, Hamamatsu, JP;

Takeaki Hattori, Hamamatsu, JP;

Koji Kawai, Hamamatsu, JP;

Shucheng Chu, Hamamatsu, JP;

Inventors:

Yoshinori Honda, Hamamatsu, JP;

Fumitsugu Fukuyo, Hamamatsu, JP;

Takashi Suzuki, Hamamatsu, JP;

Norio Ichikawa, Hamamatsu, JP;

Takeaki Hattori, Hamamatsu, JP;

Koji Kawai, Hamamatsu, JP;

Shucheng Chu, Hamamatsu, JP;

Assignee:

Hamamatsu Photonics K.K., Hamamatsu-shi, Shizuoka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 63/06 (2006.01); G01N 21/53 (2006.01); F21K 2/00 (2006.01); C09K 11/77 (2006.01); H01J 63/04 (2006.01);
U.S. Cl.
CPC ...
F21K 2/00 (2013.01); C09K 11/7766 (2013.01); H01J 63/06 (2013.01); H01J 63/04 (2013.01);
Abstract

An ultraviolet light generating targetincludes a substratemade of sapphire, quartz or rock crystal; and a Pr:LuAG polycrystalline film, provided on the substrate, that generates ultraviolet light upon receiving an electron beam. By using a Pr:LuAG polycrystal as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.


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