The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Jun. 01, 2011
Applicants:
Frank Torregrosa, Simiane, FR;
Laurent Roux, Marseilles, FR;
Inventors:
Frank Torregrosa, Simiane, FR;
Laurent Roux, Marseilles, FR;
Assignee:
Ion Beam Services, Peynier, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); H01J 37/32 (2006.01); H01J 37/244 (2006.01); G01T 1/02 (2006.01);
U.S. Cl.
CPC ...
G01T 1/02 (2013.01); H01J 37/32412 (2013.01); H01J 37/244 (2013.01); H01J 37/32935 (2013.01); H01J 2237/31703 (2013.01); H01J 37/32422 (2013.01); H01J 2237/24405 (2013.01); H01J 2237/2448 (2013.01);
Abstract
The present invention relates to a dose-measurement device for ion implantation, the device comprising a module CUR for estimating implantation current, a secondary electron detector DSE, and a control circuit CC for estimating the ion current by taking the difference between said implantation current and the current from said secondary electron detector. Furthermore, said high-energy secondary electron detector comprises a collector COL, P supporting exactly three mutually insulated electrodes: