The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Feb. 16, 2007
Hans Perret, Munich, DE;
Jochen Philippi, Munich, DE;
Hans Perret, Munich, DE;
Jochen Philippi, Munich, DE;
EOS GmbH Electro Optical Systems, Krailling, DE;
Abstract
A process chamber for a processing of a material by means of a directed beam of electromagnetic radiation is provided, which comprises an optical element () for coupling the beam () into the process chamber (), wherein the optical element has a surface () facing the inside of the process chamber, a wall section () surrounding the optical element (), a first inlet () for a gas that is arranged at one side of the optical element () and designed such that an escaping first gas flow () strokes substantially tangentially over the surface () of the optical element (), a second inlet () for a gas, which is designed and arranged such that an escaping second gas flow () flows at a distance to the surface () in substantially the same direction as the first gas flow ().