The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Jun. 01, 2012
Woo-seok Jeon, Seoul, KR;
Jong Kwang Lee, Daejeon, KR;
Jin Ho Ju, Seoul, KR;
Min Kang, Seoul, KR;
Hoon Kang, Suwon-si, KR;
Seung BO Shim, Asan-si, KR;
Gwui-hyun Park, Osan-si, KR;
Bong-yeon Kim, Seoul, KR;
Seon-ii Kim, Seoul, KR;
Woo-Seok Jeon, Seoul, KR;
Jong Kwang Lee, Daejeon, KR;
Jin Ho Ju, Seoul, KR;
Min Kang, Seoul, KR;
Hoon Kang, Suwon-si, KR;
Seung Bo Shim, Asan-si, KR;
Gwui-Hyun Park, Osan-si, KR;
Bong-Yeon Kim, Seoul, KR;
Seon-II Kim, Seoul, KR;
Samsung Display Co., Ltd., Yongin, KR;
Abstract
A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.