The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2014

Filed:

Mar. 11, 2013
Applicants:

Alliance for Sustainable Energy, Llc, Golden, CO (US);

Applied Optical Sciences (Aos) Corp, Rancho Palos Verdes, CA (US);

Inventors:

Bhushan Sopori, Denver, CO (US);

Anikara Rangappan, Rancho Palos Verdes, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/26 (2006.01); H01L 21/205 (2006.01); H01L 21/203 (2006.01); H01L 31/18 (2006.01); H01L 21/324 (2006.01); H01L 31/00 (2006.01); H01L 21/02 (2006.01); H05B 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1804 (2013.01); H01L 21/02433 (2013.01); H01L 21/02381 (2013.01); H01L 21/0262 (2013.01); H01L 21/02592 (2013.01); H01L 21/324 (2013.01); H05B 3/0047 (2013.01); H01L 21/02609 (2013.01);
Abstract

Systems and methods for semiconductor device PN junction fabrication are provided. In one embodiment, a method for fabricating an electrical device having a P-N junction comprises: depositing a layer of amorphous semiconductor material onto a crystalline semiconductor base, wherein the crystalline semiconductor base comprises a crystalline phase of a same semiconductor as the amorphous layer; and growing the layer of amorphous semiconductor material into a layer of crystalline semiconductor material that is epitaxially matched to the lattice structure of the crystalline semiconductor base by applying an optical energy that penetrates at least the amorphous semiconductor material.


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