The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Aug. 02, 2012
Min Kang, Seoul, KR;
Jong Kwang Lee, Daejeon, KR;
Jin Ho Ju, Seoul, KR;
Bong-yeon Kim, Seoul, KR;
Hyang-shik Kong, Seongnam-si, KR;
Kyoung Sik Kim, Seoul, KR;
Seung Hwa Baek, Incheon, KR;
Min Kang, Seoul, KR;
Jong Kwang Lee, Daejeon, KR;
Jin Ho Ju, Seoul, KR;
Bong-Yeon Kim, Seoul, KR;
Hyang-Shik Kong, Seongnam-si, KR;
Kyoung Sik Kim, Seoul, KR;
Seung Hwa Baek, Incheon, KR;
Samsung Display Co., Ltd., , KR;
Abstract
Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask.