The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Nov. 10, 2010
Applicants:
Yong Beom Shin, Daejeon, KR;
Seung Woo Lee, Gyeongsangnam-do, KR;
Inventors:
Yong Beom Shin, Daejeon, KR;
Seung Woo Lee, Gyeongsangnam-do, KR;
Assignee:
Korea Research Institute of Bioscience and Biotechnology, Daejeon, KR;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/027 (2006.01); G03F 7/00 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0272 (2013.01); G03F 7/0035 (2013.01); G03F 7/40 (2013.01); G02B 2207/101 (2013.01);
Abstract
The present invention relates to a lithography method using tilted evaporation, and includes: (1) coating a resist on top of a substrate; (2) patterning the resist using a lithography process; (3) tilt-evaporating a first thin film material on an upper layer of the patterned resist to form a modified pattern mask; (4) evaporating a second thin film material on the top of the substrate with the modified pattern mask; and (5) removing the resist coated on the top of the substrate.