The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
May. 30, 2012
Chengming He, Guangdong, CN;
Quan Cheng, Guangdong, CN;
Liang Xu, Guangdong, CN;
Rong Cao, Guangdong, CN;
Chengming He, Guangdong, CN;
Quan Cheng, Guangdong, CN;
Liang Xu, Guangdong, CN;
Rong Cao, Guangdong, CN;
Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;
Abstract
The present invention discloses a method of splicing polarized films. The method includes steps of providing a substrate; attaching a first polarized film to the substrate; attaching a second polarized film to the substrate so that a side portion of the second polarized film is correspondingly overlapped with a side portion of the first polarized film; correspondingly cutting off the overlapped side portions of the first polarized film and the second polarized film; removing separated parts of the side portions from the first polarized film and the second polarized film; and performing a flatten treatment to the cut side portions of the first polarized film and the second polarized film. The method effectively reduces the interval between spliced polarized films so that the light leakage problem at the joint position is improved.