The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
Jun. 18, 2003
Catherine Chaix, La Celle-Saint-Cloud, FR;
Alain Jarry, Verneuil sur Seine, FR;
Pierre-andré Nutte, Paris, FR;
Jean-pierre Locquet, Bern, CH;
Jean Fompeyrine, Waedenswil, CH;
Heinz Siegwart, Zurich, CH;
Catherine Chaix, La Celle-Saint-Cloud, FR;
Alain Jarry, Verneuil sur Seine, FR;
Pierre-André Nutte, Paris, FR;
Jean-Pierre Locquet, Bern, CH;
Jean Fompeyrine, Waedenswil, CH;
Heinz Siegwart, Zurich, CH;
Riber, Bezons, FR;
Abstract
The invention concerns a material evaporation chamber including a vacuum chamber (), a first pumping unit () to pump said chamber and sources of material. According to the invention, a wall () liable to provide total or partial vacuum tightness, delineates within this chamber a first volume () and a second volume (). Certain sources of material () having a main axis () are placed in the second volume (). This second volume () is pumped by a second pumping unit (). The wall () includes recesses () which are each centered on the main axis () of one of the sources of material (). The evaporation chamber also comprises means () for plugging or clearing each of said recesses (), said means () being controlled individually to protect the sources of material () having a main axis () unused.