The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2014

Filed:

Feb. 29, 2012
Applicants:

Yngvar Rossow Sethne, Barcelona, ES;

Utpal Kumar Sarkar, Sant Quirze del Valles Barcelona, ES;

Marcos Casaldaliga Albisu, Sant Cugat del Valles, ES;

Inventors:

Yngvar Rossow Sethne, Barcelona, ES;

Utpal Kumar Sarkar, Sant Quirze del Valles Barcelona, ES;

Marcos Casaldaliga Albisu, Sant Cugat del Valles, ES;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 29/38 (2006.01); B41J 2/21 (2006.01); B41J 29/393 (2006.01);
U.S. Cl.
CPC ...
B41J 2/2132 (2013.01); B41J 29/38 (2013.01); B41J 29/393 (2013.01);
Abstract

In one example, a first swath is caused to be printed by a print unit on a media. The media is advanced with respect to the print unit. For a nominal second swath to be printed to beneath and adjacent to the first swath, a plurality of adjustment regions along the width of the nominal second swath are determined in accordance with a profile of non-constant advance errors for the media. An adjusted second swath is formed by, for each of the regions, adjusting the height of the nominal second swath in memory based on the determined amount of advancement error for the region. The print unit is caused to print the adjusted second swath on the media.


Find Patent Forward Citations

Loading…