The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2014
Filed:
May. 08, 2008
Maximilian A. Biberger, Scottsdale, AZ (US);
Frederick P. Layman, Carefree, AZ (US);
Maximilian A. Biberger, Scottsdale, AZ (US);
Frederick P. Layman, Carefree, AZ (US);
SDCmaterials, Inc., Tempe, AZ (US);
Abstract
A plasma-arc vaporization chamber includes features configured to permit very high-energy plasmas, preferably with high hydrogen content. The vaporization chamber includes a female electrode having an internal chamber with a target region made of a conductive material highly resistant to thermal degradation and an isthmus region of sufficient width to slow plasma flow therethrough enough to permit vaporization within the internal chamber of a material delivered into the plasma. The material is preferably injected at an angle counter to the flow of the plasma. The vaporization chamber also includes a flange-cooling chamber adjacent to a flange of the female electrode. Additionally, the chamber preferably includes vortexing gas injectors configured to provide a helical gas flow within at least a portion of the internal chamber.