The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Nov. 29, 2012
Applicant:

Novatek Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Lei Zhou, Shanghai, CN;

Guangzhi Liu, Shanghai, CN;

Heng Yu, Shanghai, CN;

Chun Wang, Shanghai, CN;

Assignee:

NOVATEK Microelectronics Corp., Hsinchu Science Park, Hsin-Chu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2006.01); H04N 13/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0081 (2013.01); H04N 13/00 (2013.01);
Abstract

A method of detecting image format includes dividing a single-frame image into a plurality of macro-blocks; calculating a correlation coefficient of a left-half image of the single-frame image and a right-half image of the single-frame image as a first global similarity; calculating a correlation coefficient of a top-half image of the single-frame image and a bottom-half image of the single-frame image as a second global similarity; calculating a portion difference of each macro-block; comparing the portion differences of the left-half image and the right-half image, for acquiring a first local similarity; comparing the portion differences of the top-half image and the bottom-half image, for acquiring a second local similarity; and detecting an image format of the single-frame image according to the first global similarity, the second global similarity, the first local similarity, the second local similarity, a first threshold and a second threshold.


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