The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Oct. 08, 2012
Applicant:

Oxford Instruments Nanotechnology Tools Limited, Abingdon, Oxfordshire, GB;

Inventors:

Peter J. Statham, High Wycombe, GB;

Angus Bewick, Abingdon, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/29 (2006.01);
U.S. Cl.
CPC ...
H01J 37/29 (2013.01);
Abstract

An apparatus for detecting one or each of Kikuchi and Kossel diffraction patterns is provided. The apparatus comprises an electron column adapted in use to provide an electron beam () directed to wards a sample (), the electron beam () having an energy in the range 2 keV to 50 keV, and a particle detector () for receiving and counting particles () from the sample () due to interaction of the electron beam () with the sample (), the detector comprising an array of pixels () and having a count rate capability of at least 1000 particles per second for each pixel. The particle detector () is further adapted to provide electronic energy filtering of the received particles in order to count the received particles which are representative of the said diffraction pattern.


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