The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Mar. 31, 2011
Applicants:

Tadashi Kuratomi, Kitakyushu, JP;

Katsumi Nagano, Tokyo, JP;

Inventors:

Tadashi Kuratomi, Kitakyushu, JP;

Katsumi Nagano, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 55/02 (2006.01); C10M 105/38 (2006.01); C07C 69/34 (2006.01); C07C 67/02 (2006.01);
U.S. Cl.
CPC ...
C10M 105/38 (2013.01); C10M 2205/0285 (2013.01); C10N 2240/04 (2013.01); C10M 2215/086 (2013.01); C10M 2215/223 (2013.01); C10N 2240/204 (2013.01); C10N 2240/02 (2013.01); C10M 2215/08 (2013.01); C10M 2207/2835 (2013.01); C10N 2230/02 (2013.01); C10M 2230/02 (2013.01); C10M 2215/28 (2013.01); C10M 2215/064 (2013.01); C10N 2240/08 (2013.01); C10N 2230/74 (2013.01); C10N 2220/028 (2013.01);
Abstract

Provided are a lubricating oil base oil having characteristics of low volatility and excellent low-temperature fluidity and capable of providing long-lasting lubrication property in a wide temperature range from low temperature to high temperature, and a lubricating oil composition using the same. The lubricating oil base oil includes a diester obtained through a reaction between a diol component formed of 1,12-dodecanediol and a carboxylic acid component formed of 2-methylpentanoic acid or 2-methylpentanoic acid and 2-ethylhexanoic acid. The diester is represented by RCOOROOCR, where Rrepresents an alkylene derived from the diol component and Rand Reach represent an alkyl derived from the carboxylic acid component, and includes 45 to 100 mol % of a diester in which both of Rand Rrepresent C5 alkyls.


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