The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Nov. 18, 2011
Applicants:

Takumi Mikawa, Shiga, JP;

Yukio Hayakawa, Kyoto, JP;

Yoshio Kawashima, Osaka, JP;

Takeki Ninomiya, Osaka, JP;

Inventors:

Takumi Mikawa, Shiga, JP;

Yukio Hayakawa, Kyoto, JP;

Yoshio Kawashima, Osaka, JP;

Takeki Ninomiya, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); H01L 21/8239 (2006.01); H01L 21/02 (2006.01); H01L 27/24 (2006.01); H01L 27/102 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1233 (2013.01); H01L 45/146 (2013.01); H01L 27/2409 (2013.01); H01L 45/1675 (2013.01); H01L 27/1021 (2013.01); H01L 45/08 (2013.01);
Abstract

Provided is a method for manufacturing a variable resistance nonvolatile semiconductor memory element, and a nonvolatile semiconductor memory element which make it possible to operate at a low voltage and high speed when initial breakdown is caused, and exhibit favorable diode element characteristics. The method for manufacturing the nonvolatile semiconductor memory element includes, after forming a top electrode of a variable resistance element and at least before forming a top electrode of an MSM diode element, oxidizing to insulate a portion of a variable resistance film in a region around an end face of a variable resistance layer.


Find Patent Forward Citations

Loading…