The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2014
Filed:
May. 07, 2012
Applicants:
Ovadia Abed, Austin, TX (US);
Yunjun LI, Austin, TX (US);
James P. Novak, Austin, TX (US);
Samuel Kim, Austin, TX (US);
Patrick Ferguson, Austin, TX (US);
Inventors:
Ovadia Abed, Austin, TX (US);
Yunjun Li, Austin, TX (US);
James P. Novak, Austin, TX (US);
Samuel Kim, Austin, TX (US);
Patrick Ferguson, Austin, TX (US);
Assignee:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/0224 (2006.01); H01L 31/18 (2006.01); H01B 1/22 (2006.01); C09D 11/02 (2014.01); B05D 5/12 (2006.01); H01L 21/306 (2006.01); C09K 13/00 (2006.01); B82Y 30/00 (2011.01); H01B 1/02 (2006.01);
U.S. Cl.
CPC ...
H01B 1/02 (2013.01); H01L 31/022425 (2013.01); Y02E 10/50 (2013.01); Y10S 977/773 (2013.01);
Abstract
For solar cell fabrication, the addition of precursors to printable media to assist etching through silicon nitride or silicon oxide layer thus affording contact with the substance underneath the nitride or oxide layer. The etching mechanism may be by molten ceramics formed in situ, fluoride-based etching, as well as a combination of the two.