The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Jan. 04, 2010
Applicants:

David Todd Emerson, Chapel Hill, NC (US);

Robert Allen Garner, Cary, NC (US);

Michael John Bergmann, Chapel Hill, NC (US);

Keenan Carlyle Brown, Raleigh, NC (US);

Michael Allen Pennington, Cary, NC (US);

Thomas Goldthwaite Coleman, Pittsboro, NC (US);

Inventors:

David Todd Emerson, Chapel Hill, NC (US);

Robert Allen Garner, Cary, NC (US);

Michael John Bergmann, Chapel Hill, NC (US);

Keenan Carlyle Brown, Raleigh, NC (US);

Michael Allen Pennington, Cary, NC (US);

Thomas Goldthwaite Coleman, Pittsboro, NC (US);

Assignee:

Cree, Inc., Durham, NC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/46 (2006.01); C30B 25/10 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/46 (2013.01); C30B 25/105 (2013.01); H01L 21/67103 (2013.01);
Abstract

A vapor deposition reactor and associated method are disclosed that increase the lifetime and productivity of a filament-based resistive-heated vapor deposition system. The reactor and method provide for heating the filament while permitting the filament to move as it expands under the effect of increasing temperature while limiting the expanding movement of the filament to an amount that prevents the expanding movement of the filament from creating undesired contact with any portions of the reactor.


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