The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

May. 30, 2012
Applicants:

Lung-hai Wu, Taoyuan County, TW;

Cyun-tai Hong, New Taipei, TW;

Fung-hsu Wu, Taoyuan County, TW;

Inventors:

Lung-Hai Wu, Taoyuan County, TW;

Cyun-Tai Hong, New Taipei, TW;

Fung-Hsu Wu, Taoyuan County, TW;

Assignee:

Benq Materials Corporation, Taoyuan County, unknown;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B21H 1/14 (2006.01); B21H 1/18 (2006.01); B21H 1/22 (2006.01); B26D 3/08 (2006.01); B31F 1/07 (2006.01);
U.S. Cl.
CPC ...
B26D 3/08 (2013.01); B31F 1/07 (2013.01); B31F 2201/0717 (2013.01); B31F 2201/0733 (2013.01); B31F 2201/0756 (2013.01);
Abstract

A method for producing a roller used for manufacturing a retarder film is provided. The method includes providing the roller having a roller surface; providing an embossing tool having an embossing end and embossing the roller surface with the embossing tool. The embossing end has a plurality of first microgroove structures and second microgroove structures. The first and second micro-groove structures are both parallel structures. Each one of the first microgroove structures is symmetric to each one of the second microgroove structures with respect to a symmetry line. An included angle of the symmetry line between each first micro-groove structure and that between each second micro-groove structure are 45±8 degrees.


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