The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Dec. 28, 2012
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Peter Michael Edic, Albany, NY (US);

Colin Richard Wilson, Niskayuna, NY (US);

Jeffery Wayne Eberhard, Albany, NY (US);

Dan Xu, Aurora, IL (US);

Assignee:

General Electric Company, Niskayuna, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 11/00 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/50 (2013.01); G06T 11/003 (2013.01);
Abstract

An energy-sensitive system includes one or more processors configured to determine spectral attenuation curves for a first basis material and a second basis material, respectively. The one or more processors are configured to substitute a k-edge feature in the determined spectral attenuation curves with an approximation of the determined spectral attenuation curves lacking the k-edge feature. The one or more processors are also configured to construct a material decomposition model based on one of the determined or approximated first and second spectral attenuation curves. The one or more processors are additionally configured to decompose X-ray projection data into basis material projection data comprising first and second line integrals based, at least in part, on the model.


Find Patent Forward Citations

Loading…