The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Apr. 19, 2012
Applicants:

Robert David Darrow, Scotia, NY (US);

Thomas Foo, Clifton Park, NY (US);

Maggie Fung, Waukesha, WI (US);

Vivek Prabhakar Vaidya, Bangalore, IN;

Xiaodong Tao, Niskayuna, NY (US);

Inventors:

Robert David Darrow, Scotia, NY (US);

Thomas Foo, Clifton Park, NY (US);

Maggie Fung, Waukesha, WI (US);

Vivek Prabhakar Vaidya, Bangalore, IN;

Xiaodong Tao, Niskayuna, NY (US);

Assignee:

General Electric Company, Niskayuna, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods for landmark correction in Magnetic Resonance Imaging (MRI) are provided. One method includes acquiring at least one calibration image or at least one localizer image of an object, identifying in the calibration or localizer images a region of the object as a reference point, wherein the reference point defines a landmark position. The method further includes determining an offset between an initial landmark position and the identified landmark position. The method also includes using the determined offset for MRI.


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