Cross point variable resistance nonvolatile memory device

Abstract

Each memory cell is formed at a different one of cross points of bit lines extending in an X direction and formed in a plurality of layers and word lines extending in a Y direction. In a multilayer cross point structure in which a plurality of vertical array planes sharing the word lines are aligned in the Y direction each for a group of bit lines aligned in a Z direction, even and odd layer bit line selection switch elements switch connection and disconnection between a global bit line and the commonly-connected even layer bit line and the commonly-connected odd layer bit line, respectively. Each of the even and odd layer bit line selection switch elements has both a bit line selection function and a current limiting function in low resistance writing.