The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Jul. 11, 2013
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Ryo Matsuno, Saitama, JP;

Satoshi Yoneyama, Saitama, JP;

Takashi Koike, Saitama, JP;

Kazuhide Hasegawa, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); B29D 11/00 (2006.01); G02B 3/00 (2006.01); G02B 13/00 (2006.01); G02B 7/02 (2006.01); G02B 5/00 (2006.01); G02B 1/11 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0062 (2013.01); B29D 11/00278 (2013.01); G02B 13/0085 (2013.01); G02B 13/001 (2013.01); G02B 7/025 (2013.01); G02B 1/11 (2013.01); G02B 5/005 (2013.01);
Abstract

Provided is a stack-type lens array capable of preventing a lens from peeling off due to stress during dicing or vibration and impact when used. The stack-type lens array is formed by stacking and bonding two lens sheets in which micro lenses are arranged on a flat portion at predetermined intervals. Antireflection films are vapor-deposited on a convex surface and a concave surface of the lens and a light shielding film is vapor-deposited such that a circular opening is formed at the center of the concave surface. The opening serves as a diaphragm aperture of the lens. An exposed surface in which neither the antireflection film nor the light shielding film is vapor-deposited is provided outside the light shielding film between adjacent lenses. A dicing line is set at the center of the exposed surface. An adhesive layer is formed in a predetermined pattern on the exposed surface.


Find Patent Forward Citations

Loading…