The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Oct. 20, 2010
David Ovrutsky, Charlotte, NC (US);
Hagit Gershtenman-avsian, Huntersville, NC (US);
Alan Kathman, Charlotte, NC (US);
Jennifer Plyler, Charlotte, NC (US);
David Ovrutsky, Charlotte, NC (US);
Hagit Gershtenman-Avsian, Huntersville, NC (US);
Alan Kathman, Charlotte, NC (US);
Jennifer Plyler, Charlotte, NC (US);
FLIR Systems Trading Belgium BVBA, Meer, BE;
Abstract
Optical imaging apparatuses are provided having desired focal properties. An optical imaging apparatus can include at least one wafer level optical element, a spacer, a second wafer comprising a focus compensation standoff, and an electro-optical element. For some apparatuses, the focus compensation standoff may include an electro-optical element mounting surface having a roughness different from at least one other surface of the focus compensation standoff. Also described are methods of producing a plurality of optical imaging apparatuses. Some methods include providing an optical wafer having a first and second optical element, determining a first and second focal point of a first and second optical die; providing a second wafer having a first and second focus compensation standoff; and adjusting the heights of the first and second focus compensation standoffs to position a first and second electro-optical element at or near a first and second focal point, respectively.