The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Dec. 09, 2013
3m Innovative Properties Company, St. Paul, MN (US);
Robert J. DeVoe, Mahtomedi, MN (US);
Brian J. Gates, Osceola, WI (US);
Dean Faklis, Springwater, NY (US);
Robert T. Krasa, Hudson, WI (US);
Przemyslaw P. Markowicz, Woodbury, MN (US);
Craig R. Sykora, New Richmond, WI (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
An exposure system includes a light source emitting a beam along an optical axis that is capable of inducing a multi-photon reaction in a resin. The exposure system further includes a resin undergoing multiphoton reaction, as well as an automated system including a monitor that measures at least one property of the beam selected from power, pulse length, shape, divergence, or position in a plane normal to the optical axis. The monitor generates at least one signal indicative of the property of the beam, and a sub-system adjusts the beam in response to the signal from the monitor.