The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Oct. 31, 2012
Applicant:

Panasonic Corporation, Kadoma, JP;

Inventors:

Yoshihiro Sato, Toyama, JP;

Hideyuki Arai, Toyama, JP;

Takayuki Yamada, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/092 (2006.01); H01L 21/8238 (2006.01); H01L 21/768 (2006.01); H01L 27/11 (2006.01); H01L 27/105 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823842 (2013.01); H01L 21/76895 (2013.01); H01L 27/1116 (2013.01); H01L 27/1104 (2013.01); H01L 27/105 (2013.01); H01L 21/28518 (2013.01); Y10S 257/903 (2013.01);
Abstract

A first dual-gate electrode includes a gate electrode located on a first active region and having a first silicon film of a first conductivity type and a gate electrode located on a second active region and having a first silicon film of a second conductivity type. A second dual-gate electrode includes a gate electrode located on a third active region and having a second silicon film of the first conductivity type and a gate electrode located on a fourth active region and having a second silicon film of the second conductivity type. At least a portion of the first silicon film of the first conductivity type has a first-conductivity-type impurity concentration higher than that of a portion of the second silicon film of the first conductivity type located on the third active region.


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