The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Mar. 05, 2013
Applicant:

Société DE Commercialisation Des Produits DE LA Recherche Appliquée—socpra SC, Sherbrooke, CA;

Inventors:

Daniel Houde, Sherbrooke, CA;

Ridthee Meesat, Bangkok, TH;

Jean-François Allard, Princeville, CA;

Tiberius Brastaviceanu, Montreal, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); G01N 21/39 (2006.01); G21K 5/08 (2006.01); B23K 26/02 (2014.01); A61N 5/10 (2006.01); A61L 2/08 (2006.01); A61B 18/20 (2006.01); A61N 5/06 (2006.01); G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
G21K 5/00 (2013.01); A61N 5/10 (2013.01); A61L 2/087 (2013.01); A61B 18/20 (2013.01); A61N 5/0624 (2013.01); A61N 2005/1088 (2013.01); A61N 2005/1089 (2013.01);
Abstract

The present disclosure relates to a method and a system for generating low-energy electrons in a biological material. The biological material is held in position by a support. Laser beam pulses are directed by a focusing mechanism toward a region of interest within the biological material. This generates filaments of low-energy electrons within the region of interest. The method and system may be used for radiotherapy, radiochemistry, sterilization, nanoparticle coating, nanoparticle generation, and like uses.


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