The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Sep. 16, 2011
Seung Sang Hwang, Seoul, KR;
Kyung Youl Baek, Seoul, KR;
He Seung Lee, Seoul, KR;
Soon Man Hong, Seoul, KR;
Soon Jong Kwak, Seoul, KR;
Chong Min Koo, Gyeonggi-do, KR;
Seung Sang Hwang, Seoul, KR;
Kyung Youl Baek, Seoul, KR;
He Seung Lee, Seoul, KR;
Soon Man Hong, Seoul, KR;
Soon Jong Kwak, Seoul, KR;
Chong Min Koo, Gyeonggi-do, KR;
Korea Institute of Science and Technology, Seoul, KR;
Abstract
A monomer composition for polymerizing a branch-type silsesquioxane polymer is disclosed. The monomer composition includes hydroxy-substituted cyclic siloxane in a solvent, and the hydroxy-substituted cyclic siloxane includes stereoisomers of cyclic siloxane of cis, trans, random and twist structures at controlled ratios. Also disclosed are a branch-type silsesquioxane polymer synthesized by polymerizing the monomer composition for polymerizing a branch-type silsesquioxane polymer, and a method for synthesizing the same. In accordance with the disclosure, the isomers can be isolated stably at desired ratios. The isolated isomers may be polymerized into polymers of various types. Since the polymers exhibit low dielectric property, they may be utilized as low dielectric materials.