The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Mar. 30, 2009
Hiroyuki Einaga, Shizuoka, JP;
Hiroyuki Einaga, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
With the objective of providing a photosensitive transparent resin composition that is reduced in the exposure illuminance dependency, allows high residual film ratio and little development scum and can stably form a pattern with good resolution, a color filter ensuring little decrease in the transmittance for visible light and enabling display of a high-quality definite image, and a production method thereof, there is provided a photosensitive transparent resin composition containing at least a polymerizable monomer, an alkali-soluble resin, a photopolymerization initiator and a compound represented by the following formula (I): wherein each of Rand Rindependently represents a hydrogen atom, an alkyl group having a carbon number of 1 to 20 or an aryl group having a carbon number of 6 to 20, Rand Rmay be the same or different but are not a hydrogen atom at the same time, Rand Rmay form a cyclic amino group together with the nitrogen atom, each of Rand Rindependently represents an electron-withdrawing group, and Rand Rmay combine with each other to form a cyclic electron-withdrawing group.