The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2014

Filed:

Nov. 18, 2010
Applicants:

Peter John Cousins, Menlo Park, CA (US);

Michael Joseph Cudzinovic, Sunnyvale, CA (US);

Inventors:

Peter John Cousins, Menlo Park, CA (US);

Michael Joseph Cudzinovic, Sunnyvale, CA (US);

Assignee:

SunPower Corporation, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 7/00 (2006.01); H01L 31/0224 (2006.01); H01L 21/768 (2006.01); H01L 31/068 (2012.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 31/022425 (2013.01); H01L 21/76802 (2013.01); H01L 31/022441 (2013.01); H01L 31/0682 (2013.01); H01L 21/0337 (2013.01); H01L 21/31144 (2013.01); Y02E 10/547 (2013.01);
Abstract

Fabrication of a solar cell using a printed contact mask. The contact mask may include dots formed by inkjet printing. The dots may be formed in openings between dielectric layers (e.g., polyimide). Intersections of overlapping dots may form gaps that define contact regions. The spacing of the gaps may be dictated by the alignment of nozzles that dispense the dots. Using the dots as a contact mask, an underlying dielectric layer may be etched to form the contact regions through the underlying dielectric layer. Metal contact fingers may be formed over the wafer to form electrical connections to corresponding diffusion regions through the contact regions.


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