The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Dec. 16, 2010
Denis Aleksandrovich Sokolov, Atlanta, GA (US);
Kristin Rene Shepperd, Conyers, GA (US);
Thomas Michael Orlando, Atlanta, GA (US);
Denis Aleksandrovich Sokolov, Atlanta, GA (US);
Kristin Rene Shepperd, Conyers, GA (US);
Thomas Michael Orlando, Atlanta, GA (US);
Georgia Tech Research Corporation, Atlanta, GA (US);
Abstract
Graphene production using a continuous or pulsed laser beam focused on a substrate of graphite oxide in a significantly inert environment is disclosed. Laser-induced graphene features are characterized by a 2D-band in the Raman spectra. When the photons of the laser at a various frequencies and power levels beam impinge a graphite oxide foil for various amounts of time, a strip, divet, trench, or hole, having graphene at the bottom or sides is produced. The concentration of the graphite oxide and the laser beam may be adjusted so that the depth of the trench created is a certain depth less than the thickness of the foil. Additionally, in some embodiments, the evaporation of the water during the Hummers method is adjusted so that there remains interlaminar water in the graphite oxide foil. The presently disclosed subject matter may also be used in patterning using rastering or substrate motion.