The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Nov. 28, 2012
Applicant:
Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;
Inventors:
Assignee:
SCREEN Holdings Co., Ltd., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); H01L 21/67 (2006.01); B44C 1/22 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
B44C 1/227 (2013.01); H01L 21/67028 (2013.01); H01L 21/31116 (2013.01); H01L 21/6708 (2013.01); H01L 21/67207 (2013.01);
Abstract
A substrate processing method includes a water removing step of removing water from a substrate, a silylating step of supplying a silylating agent to the substrate after the water removing step, and an etching step of supplying an etching agent to the substrate after the silylating step. The substrate may have a surface on which a nitride film and an oxide film are exposed and in this case, the etching step may be a selective etching step of selectively etching the nitride film by the etching agent. The etching agent may be supplied in a form of a vapor having an etching component.