The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Feb. 05, 2009
Applicants:
Mark Anthony Fernance Kendall, Chelmer, AU;
Derek William Kenneth Jenkins, Wantage, GB;
Inventors:
Mark Anthony Fernance Kendall, Chelmer, AU;
Derek William Kenneth Jenkins, Wantage, GB;
Assignee:
The University of Queensland, St. Lucia, AU;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/00 (2006.01); B81C 1/00 (2006.01); A61M 37/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00111 (2013.01); A61M 2037/0046 (2013.01); A61M 37/0015 (2013.01); B81B 2201/055 (2013.01); A61M 2037/0023 (2013.01); A61M 2037/0053 (2013.01);
Abstract
A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form the projections, wherein the passivant does not include oxygen.