The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8882960 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 11, 2014

Filed:

Apr. 18, 2012
Applicants:

Norio Yoshikawa, Kyoto, JP;

Kazuo Jodai, Kyoto, JP;

Yukio Tomifuji, Kyoto, JP;

Shigeki Minami, Kyoto, JP;

Kazuto Ozaki, Kyoto, JP;

Inventors:

Norio Yoshikawa, Kyoto, JP;

Kazuo Jodai, Kyoto, JP;

Yukio Tomifuji, Kyoto, JP;

Shigeki Minami, Kyoto, JP;

Kazuto Ozaki, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C23F 1/08 (2006.01); C03C 15/00 (2006.01);
U.S. Cl.
CPC ...
C03C 15/00 (2013.01); Y10S 134/902 (2013.01);
Abstract

An etchant is stored in a treating tank; a glass substrate is transported with transport rollers into the treating tank; the etchant is discharged from below the substrate to raise the substrate to a position above the transport rollers and below the surface of the etchant; the discharge of the etching liquid is stopped and the glass substrate is lowered to a position for contacting the transport rollers; the etchant is drained from the treating tank; and the glass substrate is unloaded with the transport rollers out of the treating tank. The disclosed method and apparatus can treat both front and back surfaces of the substrate uniformly.


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Yoshikawa, Norio. (2014). Substrate treating apparatus and substrate treating method (U.S. Patent No. 8882960). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8882960

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