The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Oct. 25, 2010
Yun-ho Kook, Seoul, KR;
Chul-ho Kim, Paju-si, KR;
Sang-chul Jung, Gumi-si, KR;
Jeong-hoon Lee, Gumi-si, KR;
Nam-kook Kim, Suwon-si, KR;
Jun-young Yang, Gyeongbuk, KR;
Yun-Ho Kook, Seoul, KR;
Chul-Ho Kim, Paju-si, KR;
Sang-Chul Jung, Gumi-si, KR;
Jeong-Hoon Lee, Gumi-si, KR;
Nam-Kook Kim, Suwon-si, KR;
Jun-Young Yang, Gyeongbuk, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
Disclosed is a method for fabricating a cliché that can prevent formation of a defective thin film pattern, and a method for forming a thin film pattern using the same. The method for fabricating a cliché includes providing a base substrate having first and second regions, forming a first depressed pattern having a first depth and a first width at a first region, and a second depressed pattern having a second width greater than the first width and a depth the same with the first depth at a second region, forming a protective film for exposing the second region and covering the first region, the protective film having adhesivity, forming the second depressed pattern to have a second depth deeper than the first depth of the first depressed pattern at the first region by using the protective film having the adhesivity, and removing the protective film.